Implications of the Contact Radius to Line Step (CRLS) ratio in AFM for nanotribology measurements

Langmuir

Volumn 22, Issue 14, 2006, Pages 6130-6141

  Helt, James M ^a,c   Batteas, James D ^b  

^a CITY UNIVERSITY OF NEW YORK   (United States)

^b TEXAS A AND M UNIVERSITY   (United States)

^c AEROSPACE CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION PARAMETERS; CONTACT RADIUS; IMAGE RESOLUTION; NANOTRIBOLOGY;

ATOMIC FORCE MICROSCOPY; LITHOGRAPHY; LOADS (FORCES); PARAMETER ESTIMATION; TRIBOLOGY; WEAR OF MATERIALS;

SURFACE MEASUREMENT;

EID: 33746572711     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la053288k     Document Type: Article

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