Zr-Si-N films fabricated using hybrid cathodic arc and chemical vapour deposition: Structure vs. properties

Surface and Coatings Technology

Volumn 200, Issue 14-15, 2006, Pages 4213-4219

  Winkelmann, A ^a   Cairney, J M ^a   Hoffman, M J ^a   Martin, P J ^b   Bendavid, A ^b  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

^b CSIRO   (Australia)

Author keywords

Focused ion beam (FIB); Hard coatings; Nanocomposites; Transmission electron microscopy (TEM); Zirconium nitride

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; CRYSTAL STRUCTURE; FILMS; GRAIN BOUNDARIES; MECHANICAL PROPERTIES; NANOSTRUCTURED MATERIALS; PHYSICAL VAPOR DEPOSITION; SILICON WAFERS; TRANSMISSION ELECTRON MICROSCOPY; ZIRCONIUM COMPOUNDS;

FOCUSED ION BEAM (FIB); HARD COATING; HYBRID CATHODIC ARC; ZIRCONIUM NITRIDE;

INORGANIC COATINGS;

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; CRYSTAL STRUCTURE; FILMS; GRAIN BOUNDARIES; INORGANIC COATINGS; MECHANICAL PROPERTIES; NANOSTRUCTURED MATERIALS; PHYSICAL VAPOR DEPOSITION; SILICON WAFERS; TRANSMISSION ELECTRON MICROSCOPY; ZIRCONIUM COMPOUNDS;

EID: 33644663828     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.01.004     Document Type: Article

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