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Surface and Coatings Technology

Volumn 200, Issue 7, 2005, Pages 2525-2530

Structure, stress and hardness of sputter deposited nanocomposite W-Si-N coatings

(4) Fu, T a,b Zhou, Z F a Li, K Y a Shen, Y G a

a CITY UNIVERSITY OF HONG KONG (Hong Kong)

b XI'AN JIAOTONG UNIVERSITY (China)

Author keywords

Films; Hardness; Magnetron sputtering; Stress; Tungsten

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPRESSIVE STRESS; CRYSTAL MICROSTRUCTURE; HARDNESS; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; PHASE COMPOSITION; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN COMPOUNDS;

NANOCOMPOSITE COATINGS; TUNGSTEN SILICON NITRIDE COATINGS;

INORGANIC COATINGS;

COATING;

EID: 29244443954 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.04.024 Document Type: Article

Times cited : (22)

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