The effects of Si addition on the structure and mechanical properties of ZrN thin films deposited by an r.f. reactive sputtering method

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 954-958

  Mae, T ^a   Nose, M ^b   Zhou, M ^c   Nagae, T ^d   Shimamura, K ^a  

^a TOYAMA NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b UNIVERSITY OF TOYAMA   (Japan)

^c OSAKA UNIVERSITY   (Japan)

^d TOYAMA INDUSTRIAL TECHNOLOGY CENTER   (Japan)

Author keywords

Internal stress; Nano indentation; Reactive sputtering; Silicon; Transmission electron microscopy; Zirconium nitride

Indexed keywords

MECHANICAL ALLOYING; NITROGEN; SILICON; THIN FILMS; TITANIUM;

REACTIVE SPUTTERING METHOD;

COATING TECHNIQUES;

CUTTING TOOL; FILM; HARDNESS; SPUTTERING; TITANIUM NITRIDE; WEAR RESISTANCE; ZIRCONIUM;

EID: 0035386115     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01187-2     Document Type: Article

References (14)