Soft X-ray emission spectroscopy study of CaF 2 (film)/Si(111): Non-destructive buried interface analysis

Applied Surface Science

Volumn 117-118, Issue , 1997, Pages 434-437

  Iwami, M ^a   Kusaka, M ^a   Hirai, M ^a   Tagami, R ^a,d   Nakamura, H ^b   Watabe, H ^c  

^a OKAYAMA UNIVERSITY   (Japan)

^b OSAKA ELECTRO COMMUNICATION UNIVERSITY   (Japan)

^c Matsushita Research Institute Tokyo Inc   (Japan)

^d JFE STEEL CORPORATION   (Japan)

Author keywords

Burned interface; CaF 2 Si interface; Nondestructive analysis; Soft X ray emission spectroscopy

Indexed keywords

ELECTRON ENERGY LEVELS; EMISSION SPECTROSCOPY; INTERFACES (MATERIALS); IRRADIATION; NONDESTRUCTIVE EXAMINATION; PHASE TRANSITIONS; SUBSTRATES; THIN FILMS;

ELECTRON IRRADIATION;

CALCIUM COMPOUNDS;

EID: 0031548144     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)80120-1     Document Type: Article

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