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Applied Surface Science

Volumn 241, Issue 1-2 SPEC. ISS., 2005, Pages 113-121

Characterization of nanolayers by sputter depth profiling

(1) Hofmann, Siegfried a

a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS (Germany)

Author keywords

AES; Depth profiling; Nanostructures; SIMS; Sputtering

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPUTER SIMULATION; INTERFACES (MATERIALS); MATHEMATICAL MODELS; MONOLAYERS; SPUTTER DEPOSITION; SURFACE ROUGHNESS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CLUSTER ION SPUTTERING; DEPTH PROFILING; MIXING ROUGHNESS INFORMATION DEPTH (MRI); NANOSTRUCTUTRES;

NANOSTRUCTURED MATERIALS;

EID: 12244312542 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2004.09.027 Document Type: Conference Paper

Times cited : (42)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.