Improved chemically amplified photoresist characterization using interdigitated electrode sensors: Photoacid diffusivity measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 392-403

  Berger, Cody M ^a   Henderson, Clifford L ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Chemically amplified photoresist; Diffusion coefficient; Impedance spectroscopy; Interdigitated electrode

Indexed keywords

CHEMICALLY AMPLIFIED PHOTORESISTS; IMPEDANCE SPECTROSCOPY; INTERDIGITATED ELECTRODES;

ABSORPTION; ATMOSPHERIC HUMIDITY; DATA REDUCTION; DIFFUSION; ELECTRODES; RATE CONSTANTS; SENSORS; THIN FILMS;

PHOTORESISTS;

EID: 3843144915     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536218     Document Type: Conference Paper

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