Understanding quencher mechanisms by considering photoacid-dissociation equilibrium in chemically-amplified resists

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue I, 2005, Pages 338-349

  Nagahara, Seiji ^a,b,f,g   Yuan, Lei ^a   Poppe, Wojtek Jacob ^a   Neureuther, Andrew ^a   Kono, Yoshiyuki ^c   Sekiguchi, Atsushi ^c   Fujiwara, Koichi ^d   Watanabe, Tsuyoshi ^d   Taira, Kazuo ^e   Kusumoto, Shiro ^e   Nakano, Takanori ^e   Shimokawa, Tsutomu ^e  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b RENESAS TECHNOLOGY CORP   (Japan)

^c Jpn   (Japan)

^d JSR Micro   (United States)

^e JSR CORPORATION   (Japan)

^f UNIVERSITY OF CALIFORNIA   (United States)

^g IMEC   (Belgium)

Author keywords

Acid dissociation; Acid equilibrium quencher (AEQ) model; Chemically amplified resist; FTIR; Full dissociation; Quencher mechanism; Resist simulator; STORM; Strength of acid

Indexed keywords

ACID DISSOCIATION; ACID-EQUILIBRIUM-QUENCHER (AEQ) MODEL; CHEMICALLY AMPLIFIED RESISTS; FULL-DISSOCIATION; QUENCHER MECHANISMS; RESIST SIMULATORS; STORM; STRENGTH OF ACID;

ACIDS; COMPUTER SIMULATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MATHEMATICAL MODELS; PHOTODISSOCIATION; REACTION KINETICS; SIMULATORS;

QUENCHING;

EID: 24644445291     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.598949     Document Type: Conference Paper

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