Why do weak acids not work in 193-nm photoresists? Matrix effects on acid catalyzed deprotection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 79-93

  Pohlers, Gerd ^a   Barclay, George ^a   Razvi, Azher ^a   Stafford, Carolyne ^a   Barbieri, Tony ^a   Cameron, Jim ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CATALYSIS; INFRARED RADIATION; ORGANIC ACIDS; ORGANIC POLYMERS; REACTION KINETICS; SOLUBILITY;

ACID CATALYZED DEPROTECTION; CATIONIC INTERMEDIATE SPECIES; DEPROTECTION KINETICS; PHOTOACID GENERATORS;

PHOTORESISTS;

EID: 3843052313     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537186     Document Type: Conference Paper

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