Enabling alternating phase shifted mask designs for a full logic gate level

Journal of Microlithography, Microfabrication and Microsystems

Volumn 1, Issue 1, 2002, Pages 31-42

  Liebmann, Lars ^a   Lund, Jennifer ^a   Heng, Fook Luen ^a   Graur, Loana ^a  

^a IBM Corporation Armonk   (United States)

Author keywords

Alternating phase shifted mask; AltPSM design; AltPSM EDA

Indexed keywords

EID: 0001827834     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1435368     Document Type: Article

References (16)

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