The transfer of photoresist LER through Etch

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Pawloski, Adam R ^a   Acheta, Alden ^a   Bell, Scott ^a   Fontaine, Bruno La ^a   Wallow, Tom ^a   Levinson, Harry J ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

Image log slope (ILS); Line edge roughness (LER); Photoresist

Indexed keywords

ETCHING; GATES (TRANSISTOR); PHOTOLITHOGRAPHY; POLYSILICON; SURFACE ROUGHNESS;

IMAGE-LOG-SLOPE (ILS); LINE EDGE ROUGHNESS (LER); SPATIAL FREQUENCIES;

PHOTORESISTS;

EID: 33745612126     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.652206     Document Type: Conference Paper

References (14)

1. A. Asenov, S. Kaya, A. R. Brown, Electron Devices, IEEE Transactions on, vol. 50, pp. 1254-1260, 2003.
2. C. H. Diaz, H.-J. Tao, Y.-C. Ku, A. Yen, K. Young, Electron Device Letters, IEEE, vol. 22, pp. 287-289, 2001.
3. S. Xiong, J. Bokor, Electron Devices, IEEE Transactions on, vol. 51, pp. 228-232, 2004.
4. A. P. Mahorowala, K. Babich, Q. Lin et al., Journal of Vacuum Science & Technology A- Vacuum Surfaces and Films 18 (4), 1411 (2000).
5. Arpan P. Mahorowala, Dario L. Goldfarb, Karen Temple et al., Proceedings of SPIE - Advances in Resist Technology and Processing XX 5039, 213 (2003).
6. Patrick K. Montgomery, Richard Peters, Cesar Garza et al., Proceedings of SPIE - Advances in Resist Technology and Processing XXII 5153, 1024 (2005).
7. H. Namatsu, M. Nagase, T. Yamaguchi et al., Journal of Vacuum Science & Technology B 16 (6), 3315 (1998).
8. F. Ren, S. J. Pearton, J. R. Lothian et al., Journal of Vacuum Science & Technology B 10 (6), 2407 (1992).
9. F. Ren, S. J. Pearton, R. J. Shul et al., Journal of Electronic Materials 27 (4), 175 (1998).
10. A. R. Pawloski, A. Acheta, I. Lalovic et al., Proceedings of SPIE - Advances in Resist Technology and Processing XXI 5376, 414 (2004).
11. A. R. Pawloski, A. Acheta, H. J. Levinson et al., Proceedings of the ARCH Microelectronic Materials Interface Conference (2004).
12. A. R. Pawloski, A. Acheta, H. J. Levinson et al., Journal of Microlithography, Microfabrication, and Microsystems - in press (2006).
13. T. B. Michaelson, A. R. Pawloski, A. Acheta et al., Proceedings of SPIE - Advances in Resist Technology and Processing XXII 5753 (2005).
14. V. Constandoudis, E. Gogolides, G. P. Patsis et al., Journal of Vacuum Science & Technology B 19 (6), 2694 (2001).