Layout Optimization at the pinnacle of Optical Lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5042, Issue , 2003, Pages 1-14

  Liebmann, Lars ^b   Northrop, Greg ^a   Culp, James ^b   Sigal, Leon ^a   Barish, Arnold ^b   Fonseca, Carlos ^b  

^a IBM RESEARCH   (United States)

^b NONE

Author keywords

Design for manufacturability (DFM); Layout optimization; Radical design restrictions (RDR); Resolution enhancement techniques (RET)

Indexed keywords

DATA FLOW ANALYSIS; DATA PROCESSING; LARGE SCALE SYSTEMS; MICROPROCESSOR CHIPS; OPTICAL RESOLVING POWER; OPTIMIZATION; SYSTEMS ANALYSIS;

RADICAL DESIGN RESTRICTIONS (RDR); RESOLUTION ENHANCEMENT TECHNIQUES (RET);

PHOTOLITHOGRAPHY;

EID: 0037999075     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485245     Document Type: Conference Paper

References (15)

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