Preparation, characterization, and heck reaction of siloxane films derived from carbosilane dendrons with a bromophenyl group at the focal point and up to 27 SiCl 3 groups at the periphery

Langmuir

Volumn 21, Issue 5, 2005, Pages 1917-1922

  Deluge, Maxence ^a   Cai, Chengzhi ^a  

^a University of Houston   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT ANGLE GONIOMETRY; PHASE DEPOSITION; SILOXANE FILMS; SURFACE HECK REACTION;

CHEMICAL BONDS; CONTACT ANGLE; ELLIPSOMETRY; PHASE SEPARATION; REACTION KINETICS; SELF ASSEMBLY; SILICON COMPOUNDS; SURFACE REACTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILMS;

EID: 14844283736     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0473815     Document Type: Article

References (37)

1. Houseman, B. T.; Mrksich, M. Angew. Chem., Int. Ed. 1999, 38, 782.
2. Fryxell, G.E.;Rieke,P. C.; Wood, L.L.; Engelhard, M.H.; Williford, R. E.; Graff, G. L.; Campbell, A. A.; Wiacek, R. J.; Lee, L.; Halverson, A. Langmuir 1996, 12, 5064.
3. Spinke, J.; Liley, M.; Schmitt, F.-J.; Guder, H. J.; Angermaier, L.; Knoll, W. J. Chem. Phys. 1993, 99, 7012.
4. Spinke, J.; Liley, M.; Guder, H. J.; Angermaier, L.; Knoll, W. Langmuir 1993, 9, 1821.
5. Bain, C. D.; Whitesides, G. M. J. Am. Chem. Soc. 1989, 111, 7164.
6. Imabayashi, S.; Gon, N.; Sasaki, T.; Hobara, D.; Kakiuchi, T. Langmuir 1998, 14, 2348.
7. Heid, S.; Effenberger, F. Langmuir 1996, 12, 2118.
8. Heise, A.; Stamm, M.; Rauscher, M.; Duschner, H.; Menzel, H. Thins Solid Films 1998, 329, 199.
9. Stranick, S. J.; Parickh, A. N.; Tao, Y. T.; Allara, D. L.; Weiss, P. S. J. Phys. Chem. 1994, 98, 7636.
10. Kakiuchi, T.; Iida, M.; Gon, N.; Hobara, D.; Imabayashi, S.; Niki, K. Langmuir 2001, 17, 1599.
11. Brewer, N. J.; Legget, G. J. Langmuir 2004, 20, 4109.
12. Yam, C. M.; Cho, J.; Cai, C. Langmuir 2003, 19, 6862.
13. Yam, C. M.; Cho, J.; Cai, C. Langmuir 2004, 20, 1228.
14. Xiao, Z.; Cai, C.; Mayeux, A.; Milenkovic, A. Langmuir 2002, 18, 7728.
15. Yam, C. M.; Mayeux, A.; Milenkovic, A.; Cai, C. Langmuir 2002, 18, 10274.
16. Deng, X.; Mayeux, A.; Cai, C. J. Org. Chem. 2002, 67, 5279.
17. Deng, X.; Cai, C. Tetrahedron Lett. 2003, 44, 815.
18. Choi, Y.-S.; Yoon, C. W.; Lee, H. D.; Park, M.; Park, J. W. Chem. Commun. 2004, 1316.
19. Liu, S.; Maoz, R.; Sagiv, J. Nano Lett. 2004, 4, 845.
20. Gu, J.; Yam, C. M.; Li, S.; Cai, C. J. Am. Chem. Soc. 2004, 126, 8098.
21. Littke, A. F.; Fu, G. C. J. Am. Chem. Soc. 2001, 123, 6989.
22. Fadeev, A. J.; McCarthy, T. J. Langmuir 1999, 15, 3759.
23. Bain, C. D.; Whitesides, G. M. J. Am. Chem. Soc. 1988, 110, 3665.
24. Bain, C. D.; Troughton, E. B.; Tao, Y. T.; Evall, J.; Whitesides, G. M.; Nuzzo, R. G. J. Am. Chem. Soc. 1989, 111, 321.
25. Sabatini, E.; Cohen-Boulakia, J.; Bruening, M.; Rubinstein, I. Langmuir 1993, 9, 2974.
26. Israelachvili, J. N.; Gee, M. L. Langmuir 1989, 5, 288.
27. Drelich, J.; Miller, J. D. Langmuir 1993, 9, 619.
28. Briggs, D.; Seah, M. P. Practical Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy; John Wiley & Sons: New York, 1984.
29. Scofield, J. H. J. Electron Spectrosc. Relat. Phenom. 1976, 8, 129.
30. Heck, R. H. Acc. Chem. Res. 1979, 12, 146.
31. Tillman, N.; Ulman, A.; Penner, T. L. Langmuir 1989, 5, 101.
32. Balachander, N.; Sukenik, C. N. Langmuir 1990, 6, 1621.
33. Lee, Y. W.; Reed-Mundell, J.; Sukenik, C. N.; Zull, J. E. Langmuir 1993, 9, 3009.
34. Brandriss, S.; Margel, S. Langmuir 1993, 9, 1232.
35. Trau, M.; Murray, B. S.; Grant, K.; Griezer, F. J. Colloid Interface Sci. 1992, 148, 182.
36. Fadeev, A. Y.; McCarthy, T. J. Langmuir 2000, 16, 7268.
37. Djakovitch, L.; Wagner, M.; Hartung, C. G.; Beller, M.; Koehler, K. J. Mol. Catal. A: Chem. 2004, 219, 121.