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Volumn 88, Issue 23, 2006, Pages

Dose rate effects in bipolar oxides: Competition between trap filling and recombination

Author keywords

[No Author keywords available]

Indexed keywords

BIPOLAR OXIDES; BIPOLAR TECHNOLOGY; ENHANCED LOW-DOSE-RATE SENSITIVITY (ELDRS); OXIDE QUALITY; RECOMBINATION;

EID: 33745045395     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2210293     Document Type: Article
Times cited : (60)

References (30)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.