Bias-enhanced lateral photoelectrochemical etching of GaN for the fabrication of undercut micromachined system structures

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 3, 2006, Pages 1337-1340

  Yang, Bo ^a   Fay, Patrick ^a  

^a University of Notre Dame   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICROMACHINED SYSTEM STRUCTURES; PHOTOELECTROCHEMICAL ETCHING; WAFER ILLUMINATED ETCHING;

ETCHING; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; PHOTOCHEMICAL REACTIONS; TITANIUM;

GALLIUM NITRIDE;

EID: 33744823544     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2198848     Document Type: Article

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