A micromachined tunable resonator fabricated by the CMOS post-process of etching silicon dioxide

Microsystem Technologies

Volumn 12, Issue 8, 2006, Pages 766-772

  Dai, Ching Liang ^a   Yu, Wei Chiang ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ETCHING; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; NATURAL FREQUENCIES;

MASKLESS WET ETCHING; MICROMECHANICAL TUNABLE RESONATOR; SUSPENDED STRUCTURES; TUNING VOLTAGE;

OPTICAL RESOLVING POWER;

EID: 33744519311     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-005-0077-8     Document Type: Article

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