Characterization of Microelectromechanical Hf Resonators Fabricated Using a Soi-Based Low Temperature Process

Proceedings of IEEE Sensors

Volumn 2, Issue 2, 2003, Pages 820-824

  Ruther, P ^a   Bartholomeyczik, J ^a   Buhmann, A ^a   Paul, O ^a  

^a UNIVERSITY OF FREIBURG   (Germany)

Author keywords

High frequency resonator; Low temperature processing; Micro resonator; Sacrificial oxide; Silicon on insulator; Spring softening

Indexed keywords

COMPUTER SIMULATION; ELECTRODES; FINITE ELEMENT METHOD; GOLD; LOW TEMPERATURE EFFECTS; MICROELECTROMECHANICAL DEVICES; NATURAL FREQUENCIES; RESONANCE; SILICON ON INSULATOR TECHNOLOGY; SINGLE CRYSTALS; TRANSDUCERS;

HIGH FREQUENCY RESONATORS; LOW TEMPERATURE PROCESSING; MICRO RESONATORS; SACRIFICIAL OXIDES; SPRING SOFTENING;

RESONATORS;

EID: 1542363446     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

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