Fabrication of integrated chip with microinductors and micro-tunable capacitors by complementary metal-oxide-semiconductor postprocess

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 4 A, 2005, Pages 2030-2036

  Dai, Ching Liang ^a   Tsai, Chih Hao ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

CMOS; MEMS; Micro tunable capacitors; Microinductors; Postprocess

Indexed keywords

AMMONIUM COMPOUNDS; CAPACITANCE; CAPACITORS; CMOS INTEGRATED CIRCUITS; ELECTRIC INDUCTORS; MAGNETIC MATERIALS; MICROELECTROMECHANICAL DEVICES; PHOSPHORIC ACID;

MICRO-TUNABLE CAPACITORS; MICROINDUCTORS; PLANAR SPIRAL INDUCTORS; POSTPROCESS;

MICROPROCESSOR CHIPS;

EID: 21244449962     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.2030     Document Type: Article

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