High-frequency high-Q micro-mechanical resonators in thick epipoly technology with post-process gap adjustment

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2002, Pages 665-668

  Galayko, Dimitri ^a   Kaiser, Andreas ^a   Legrand, Bernard ^a   Collard, Dominique ^a,b   Buchaillot, Lionel ^a   Combi, Chantal ^c  

^a Institut Superieur de l'Electronique et du Numerique   (France)

^b UNIVERSITY OF TOKYO   (Japan)

^c STMICROELECTRONICS   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENT MEASUREMENT; ELECTRIC FREQUENCY MEASUREMENT; ELECTROSTATIC DEVICES; MICROELECTRONIC PROCESSING; MICROMACHINING; Q FACTOR MEASUREMENT; RESONATORS; TRANSDUCERS; VOLTAGE MEASUREMENT;

CLAMPED-CLAMPED BEAM MICRORESONATORS; ELECTROSTATIC MOTOR; HIGH FREQUENCY MICROMECHANICAL RESONATORS; HIGH Q MICROMECHANICAL RESONATORS; POST PROCESS GAP; THICK EPIPOLY MICROMACHINING;

MICROELECTROMECHANICAL DEVICES;

EID: 0036124053     PISSN: 10846999     EISSN: None     Source Type: Journal    
DOI: 10.1109/MEMSYS.2002.984358     Document Type: Article

References (3)

1. A sub-micron capacitive gap process for multiple-metal-electrode lateral micromechanical resonators
2. High frequency micromechanical filters
3. Reducing the effect of parasitic capacitance on MEMS measurements