Dependence of non-prestonian behavior of ceria slurry with anionic surfactant on abrasive concentration and size in shallow trench isolation chemical mechanical polishing

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 5 A, 2006, Pages 3896-3904

  Kang, Hyun Goo ^a   Kim, Dae Hyeong ^b   Katoh, Takeo ^a   Kim, Sung Jun ^a   Paik, Ungyu ^a   Park, Jea Gun ^a  

^a Hanyang University   (South Korea)

^b KCTech   (South Korea)

Author keywords

Ceria; CMP; Nitride film; Non prestonian; Oxide film; Shallow trench isolation; Surfactant concentration

Indexed keywords

CHEMICAL MECHANICAL POLISHING; NEGATIVE IONS; NITRIDES; OXIDES; SURFACE ACTIVE AGENTS; THIN FILMS;

CERIA; CMP; NITRIDE FILMS; OXIDE FILMS; SHALLOW TRENCH ISOLATION; SURFACTANT CONCENTRATION;

SLURRIES;

EID: 33646883051     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.3896     Document Type: Article

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