Characterization of 8-in. wafers printed by nanoimprint lithography

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 172-177

  Perret, C ^a   Gourgon, C ^a   Lazzarino, F ^a   Tallal, J ^a   Landis, S ^a   Pelzer, R ^b  

^a CEA LETI   (France)

^b EV GROUP   (Austria)

Author keywords

8 in. wafer; Lithography; Nanoimprint; Polymer; Saffman Taylor

Indexed keywords

CAPILLARITY; DEFORMATION; EVAPORATION; LITHOGRAPHY; MOLDING; PLASMA ETCHING; POLYMERS; SOLVENTS;

FULL-WAFER PRINTING; NANOIMPRINT;

MICROELECTRONICS;

EID: 17344394204     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00094-2     Document Type: Conference Paper

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