Influence of sub-100 nm scattering on high-energy electron beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2504-2507

  Anderson, Erik H ^a   Olynick, Deirdre L ^a   Chao, Weilun ^a   Harteneck, Bruce ^a   Veklerov, Eugene ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; CONVOLUTION; ELECTRON SCATTERING; RESISTORS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

BACKSCATTER ELECTRON ALIGNMENT; HIGH ENERGY ELECTRON BEAM LITHOGRAPHY;

ELECTRON BEAM LITHOGRAPHY;

EID: 0035519514     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1415506     Document Type: Article

References (4)

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