Influence of Molecular Arrangement in Self-Assembled Monolayers on Adhesion Forces Measured by Chemical Force Microscopy

ChemPhysChem

Volumn 4, Issue 10, 2003, Pages 1107-1111

  Duwez, Anne Sophie ^a,b   Jonas, Ulrich ^a   Klein, Hubert ^c  

^a MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

^b UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

^c AIX MARSEILLE UNIVERSITY   (France)

Author keywords

Adhesion forces; Chemical force microscopy; Molecular packing; Monolayers; Self assembly

Indexed keywords

ATOMIC FORCE MICROSCOPY; MONOLAYERS; SELF ASSEMBLED MONOLAYERS; SELF ASSEMBLY; SURFACE CHEMISTRY;

ADHESION FORCES; CHEMICAL FORCE MICROSCOPY; CHEMICAL SENSITIVITY; CHLOROSILANES; METHOXYSILANE; MOLECULAR ARRANGEMENTS; MOLECULAR PACKINGS;

ADHESION;

SILANE DERIVATIVE; THIOL; WATER;

ADHESION; ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL FORCE MICROSCOPY; CHEMICAL STRUCTURE; MOLECULAR DYNAMICS; MULTIPLE CHEMICAL SENSITIVITY; PARAMETER; SURFACE PROPERTY;

EID: 0242607005     PISSN: 14394235     EISSN: None     Source Type: Journal    
DOI: 10.1002/cphc.200300743     Document Type: Article

References (32)

1. a) C. D. Frisbie, L. F. Rozsnyai, A. Noy, M. S. Wrighton, C. M. Lieber, Science 1994, 265, 2071;
2. b) A. Noy, C. D. Frisbie, L. F. Rozsnyai, M. S. Wrighton, C. M. Lieber, J. Am. Chem. Soc. 1995, 117, 7943;
3. c) A. Noy, D. V. Vezenov, C. M. Lieber, Annu. Rev. Mater. Sci. 1997, 27, 381.
4. E. W. van der Vegte, G. Hadziioannou, Langmuir 1997, 13, 4357.
5. a) R. McKendry, M.-E. Theoclitou, C. Abell, T. Rayment, Langmuir 1998, 14, 2846;
6. b) R. McKendry, M.-E. Theoclitou, C. Abell, T. Rayment, Jpn. J. Appl. Phys. 1 1999, 38, 3901;
7. c) P. Eaton, J. R. Smith, P. Graham, J. D. Smart, T. G. Nevell, J. Tsibouklis, Langmuir 2002, 18, 3387.
8. S. C. Clear, P. F. Nealey, J. Coll. Interf. Sci. 1999, 213, 238.
9. a) B. D. Beake, G. J. Leggett, Phys. Chem. Chem. Phys. 1999, 1, 3345;
10. b) B. D. Beake, G. J. Leggett, Langmuir 2000, 16, 735.
11. A. Lio, D. H. Charych, M. Salmeron, J. Phys. Chem. B 1997, 101, 3800.
12. H. I. Kim, V. Boiadjiev, J. E. Houston, X.-Y. Zhu, J. D. Kiely, Tribol. Lett. 2001, 10, 97.
13. C. E. H. Berger, K. O. van der Werf, R. R H. Kooyman, B. G. de Grooth, J. Greve, Langmuir 1995, 11, 4188.
14. A. Ulman, Chem. Rev. 1996, 96, 1533.
15. a) A.-S. Duwez, B. Nysten, Langmuir 2001, 17, 8287;
16. b) A.-S. Duwez, C. Poleunis, P. Bertrand, B. Nysten, Langmuir 2001, 17, 6351.
17. K. Bierbaum, M. Grunze, A. A. Baski, L. F. Chi, W. Schrepp, H. Fuchs, Langmuir 1995, 11, 2143.
18. M. Goldmann, J. V. Davidovits, P. Silberzan, Thin Solid Films 1998, 327-329, 166.
19. K. I. Iimura, Y. Nakajima, T. Kato, Thin Solid Films 2000, 379, 230.
20. K. Bierbaum, M. Kinzler, Ch. Wöll, M. Grunze, G. Hähner, S. Heid, F. Effenberger, Langmuir 1995, 11, 512.
21. M. T. McDermott, J.-B. D. Green, M. D. Porter, Langmuir 1997, 13, 2504.
22. S. Lee, Y. S. Shon, R. Colorado, Jr., R. L. Guenard, T. R. Lee, S. S. Perry, Langmuir 2000, 16, 2220.
23. L. Li, Q. Yu, S. Jiang, J. Phys. Chem. B. 1999, 103, 8290.
24. R. M. Pashley, J. Israelachvili, Colloids Surf. 1981, 2, 169.
25. H. K. Christenson, P. M. Claesson, Adv. Colloid Interface Sci. 2001, 91, 391.
26. S. K. Sinniah, A. B. Steel, C. J. Miller, J. E. Reutt-Robey, J. Am. Chem. Soc. 1996, 118, 8925.
27. M. M. Walczak, C. K. Chung, S. M. Stole, C. A. Widrig, M. D. Porter, J. Am. Chem. Soc. 1991, 113, 2370.
28. T. Nakagawa, K. Ogawa, T. Kurumizawa, S. Ozaki, Jpn. J. Appl. Phys. 1993, 32, L294.
29. E. W. van der Vegte, A. Subbotin, G. Hadziioannou, P. R. Ashton, J. A. Preece, Langmuir 2000, 16, 3249.
30. K. L. Johnson, K. Kendall, A. D. Roberts, Proc. R. Soc. London Ser. A 1971, 324, 301.
31. H. Klein, W. Blanc, R. Pierrisnard, C. Fauquet, Ph. Dumas, Eur. Phys. J. B 2000, 14, 371.
32. M. Tortonese, M. Kirk, Proc. SPIE Int. Soc. Opt. Eng. 1997, 3009, 53.