Measurement of electron density of reactive plasma using a plasma oscillation method

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 A, 2002, Pages 3963-3964

  Kanoh, Masaaki ^a   Tonotani, Junichi ^a   Aoki, Katsuaki ^a   Yamage, Masashi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Electron plasma frequency; Langmuir probe; Plasma density; Plasma diagnostics; Plasma oscillation; Reactive gas plasma

Indexed keywords

CARRIER CONCENTRATION; ETCHING; NEGATIVE IONS; PLASMA DENSITY; PLASMA DIAGNOSTICS; PLASMA OSCILLATIONS; PRESSURE; PROBES; SILICA;

ELECTRON PLASMA FREQUENCY; LANGMUIR PROBE; PLASMA REACTOR MODE; REACTIVE GAS PLASMA;

PLASMAS;

EID: 0036614187     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.3963     Document Type: Article

References (6)