SiHx film growth precursors during high-rate nanocrystalline silicon deposition

Journal of Applied Physics

Volumn 99, Issue 7, 2006, Pages

  Kessels, W M M ^a   Nadir, K ^a   Van De Sanden, M C M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; DEPOSITION; NANOSTRUCTURED MATERIALS; SILICON;

DEPOSITION RATE CONDITIONS; HIGH-RATE NANOCRYSTALLINE SILICON DEPOSITION; SILICON FILM GROWTH;

FILM GROWTH;

EID: 33645905122     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2188068     Document Type: Article

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