Relationship between microstructure and photovoltaic performance in microcrystalline silicon film solar cells fabricated by a high-density microwave plasma

Thin Solid Films

Volumn 427, Issue 1-2, 2003, Pages 27-32

  Ohkawara, Go ^a   Nakajima, Masanobu ^a   Ueyama, Hiroyuki ^b   Shirai, Hajime ^a  

^a SAITAMA UNIVERSITY   (Japan)

^b Nihon Koshuha Co Ltd   (Japan)

Author keywords

(2 2 0) preferred orientation; High density plasma; Microcrystalline silicon; Microwave plasma; Photovoltaic performance

Indexed keywords

DEPOSITION; GLASS; MICROSTRUCTURE; MICROWAVES; PHOTOVOLTAIC EFFECTS; PLASMAS; QUARTZ; SHORT CIRCUIT CURRENTS; SILICON; THIN FILMS;

MICROCRYSTALLINE SILICON;

SOLAR CELLS;

EID: 0037416747     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01176-8     Document Type: Conference Paper

References (13)

1. Meier J., Torres P., Platz R., Dubail S., Kroll U., Selvan J.A.N., Pellaton Vaucher N., Hof Ch., Fischer D., Keppner H., Shar A., Ufert K.-D., Giannoules P., Koehler J. Mater. Res. Soc. Symp. Proc. 420:1996;3.
2. Yamamoto K., Yoshimi M., Suzuki T., Tawada Y., Okamoto T., Nakajima A. Mater. Res. Soc. Symp. Proc. 507:1998;131.
3. Prasad K., Finger F., Dubail S., Shah A., Schubert M. J. Non-Cryst. Solids. 137 and 138:1991;681.
4. Shirai H., Arai T., Ueyama H. Jpn. J. Appl. Phys. 37:1998;L1078.
5. Shirai H., Sakuma Y., Moriya M., Fukai C., Ueyama H. Jpn. J. Appl. Phys. 38:1999;6629.
6. Sakuma Y., Liu H., Shirai H., Moriya Y., Ueyama H. Thin Solid Films. 386:2001;261.
7. Shirai H., Sakuma Y., Ueyama H. Thin Solid Films. 337:1997;12.
8. Matusi T., Tsukiji M., Saika H., Toyama T., Okamoto H. Jpn. J. Appl. Phys. 41:2002;20.
9. Matsuda A., Kumagai K., Tanaka K. Jpn. J. Appl. Phys. 22:1983;L34.
10. Druyvesteyn M.J. Zeitschrift fur Physik. 64:1930;781.
11. Sakuma Y., Liu H., Ueyama H., Shirai H. Vacuum. 59:2000;266.
12. Matsuda A. Thin Solid Films. 337:1996;1.
13. Kondo M., Fukawa M., Guo L., Matsuda A. J. Non-Cryst. Solids. 266-269:2000;84.