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Volumn 73, Issue 16, 2006, Pages

Computational design of Si Si O2 interfaces: Stress and strain on the atomic scale

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EID: 33645763968     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.73.165312     Document Type: Article
Times cited : (35)

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