Novel aberration monitor for optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue I, 1999, Pages 77-86

  Dirksen, P ^a   Juffermans, C ^a   Pellens, R ^a   Maenhoudt, M ^a   De Bisschop, P ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; IMAGE ANALYSIS; IMAGE QUALITY; MASKS;

PHASE SHIFTING MASKS (PSM);

PHOTORESISTS;

EID: 0032664750     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.354385     Document Type: Conference Paper

References (9)