Monte-Carlo simulation of low-energy electron scattering in PMMA - Using stopping powers from dielectric formalism

Microelectronic Engineering

Volumn 77, Issue 3-4, 2005, Pages 285-291

  Tan, Zhenyu ^a   Xia, Yueyuan ^a   Liu, Xiangdong ^a   Zhao, Minwen ^a  

^a SHANDONG UNIVERSITY   (China)

Author keywords

Dielectric theory; Electron beam lithography; Monte Carlo method; Stopping power

Indexed keywords

BACKSCATTERING; ELASTICITY; ELECTRON BEAM LITHOGRAPHY; ELECTRON SCATTERING; ENERGY DISSIPATION; LIGHT SCATTERING; MONTE CARLO METHODS; POLYMETHYL METHACRYLATES;

BETHE EQUATION; DIELECTRIC THEORY; ELECTRON BACKSCATTERING; STOPPING POWER;

LOW ENERGY ELECTRON DIFFRACTION;

EID: 15344342448     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.11.009     Document Type: Article

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