New approach of Monte Carlo simulation for low energy electron beam lithography

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 179-182

  Kim, Soo Hwan ^a   Ham, Young Mog ^a   Lee, Wongyu ^a   Chun, Kukjin ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; COMPUTER SOFTWARE; ELECTRON BEAMS; ENERGY DISSIPATION; MONTE CARLO METHODS; SIMULATORS;

BETHE EQUATION;

LITHOGRAPHY;

EID: 0031654079     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00040-9     Document Type: Article

References (5)

1. D. C. Joy and S. Luo, Scanning Vol. 11, 176-180 1989
2. R. Browning et al, J. Appl. Phys. 76 (4), 15 August 1994
3. M.Yasuda et al, J. Appl. Phys. 77 (9), 1 May 1995
4. D. C. Joy, "Monte-Carlo Modeling for Electron Microscopy and Microanalysis", Oxford University Press, 1995
5. C. Lee, ME 35 (1997) 125-128