Energy deposition and transfer in electron-beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2508-2511

  Wu, Bo ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; ELECTRON EMISSION; ELECTRON ENERGY LEVELS; ELECTRON TRANSPORT PROPERTIES; MATHEMATICAL MODELS;

ELECTRON RESIST INTERACTION; ENERGY DEPOSITION;

ELECTRON BEAM LITHOGRAPHY;

EID: 0035519473     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1421548     Document Type: Article

References (11)

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