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Volumn 83, Issue 3, 2006, Pages 428-433

Electrochemical corrosion effects and chemical mechanical polishing characteristics of tungsten film using mixed oxidizers

Author keywords

Chemical mechanical polishing; Electrochemical corrosion; Mixed oxidizer; Potentiodynamic polarization; Removal rate

Indexed keywords

CHEMICAL MECHANICAL POLISHING; CURRENT DENSITY; MIXING; OXIDATION; POLARIZATION; THIN FILMS; TUNGSTEN;

DISSOLUTION RATE; MIXED OXIDIZER; POTENTIODYNAMIC POLARIZATION; REMOVAL RATE;

ELECTROCHEMICAL CORROSION;

EID: 33244460317 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2005.11.006 Document Type: Article

Times cited : (10)

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