Electrochemistry of chemical vapor deposited tungsten films with relevance to chemical mechanical polishing

Journal of the Electrochemical Society

Volumn 143, Issue 12, 1996, Pages 4095-4100

  Kneer, Emil A ^a,c   Raghunath, Chilkunda ^a,c   Raghavan, Srini ^a,c   Jeon, Joong S ^b,c  

^a University of Arizona   (United States)

^b ADVANCED MICRO DEVICES   (United States)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; CHEMICAL VAPOR DEPOSITION; DISSOLUTION; ELECTROCHEMISTRY; HYDROGEN PEROXIDE; OXIDATION; PASSIVATION; PH EFFECTS; POLARIZATION; TUNGSTEN; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL MECHANICAL POLISHING (CMP); CHEMICAL VAPOR DEPOSITED TUNGSTEN FILMS; DC POTENTIODYNAMIC POLARIZATION; LINEAR POLARIZATION; TAFEL METHODS;

SEMICONDUCTING FILMS;

EID: 0030421764     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837342     Document Type: Article

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