Electrochemical measurements during the chemical mechanical polishing of tungsten thin films

Journal of the Electrochemical Society

Volumn 144, Issue 9, 1997, Pages 3041-3049

  Kneer, E A ^a   Raghunath, C ^a   Mathew, V ^a   Raghavan, S ^a   Jeon, Joong S ^b  

^a University of Arizona   (United States)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC POLARIZATION; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; DISSOLUTION; ELECTROCHEMISTRY; OXIDATION; POLISHING; REMOVAL; TUNGSTEN;

CHEMICAL MECHANICAL POLISHING; ELECTROCHEMICAL OXIDATION; OXIDANTS; TUNGSTEN REMOVAL;

PROTECTIVE COATINGS;

EID: 0031233624     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837956     Document Type: Article

References (16)

1. E. K. Broadbent and W. T. Stacy, Solid State Technol., 51 (Dec. 1985).
2. A. Hasper, J. Holleman, J. Middelhoek, C. R. Kieijn, and C. J. Hoogendoorn, This Journal, 138, 1728 (1991).
3. M. Rutten, P. Feeney, R. Cheek, and W. Landers, Semiconductor Int., 123 (Sept. 1995).
4. P. Singer, ibid., 57 (Aug. 1994).
5. F. B. Kaufman, D. B. Thompson, R. E. Broadie, M. A. Jaso, W. L. Guthrie, D. J. Pearson, and M. B. Small, This Journal, 138, 3460 (1991).
6. E. A. Kneer, C. Raghunath, J. S. Jeon, and S. Raghavan, ibid., 143, 4095 (1996).
7. I. Ali, M. Rodder, S. R. Roy, G. Shinn, and M. I. Roja, ibid., 142, 3088 (1995).
8. K. Yang, R. J. Gutman, S. P. Muraka, E. Stonebraker, and H. Atkins, MRS Proc., 337, 145 (1994).
9. J. M. Steigerwald, D. J. Duquette, S. P. Murarka, and R. J. Gutmann, This Journal, 142, 2379 (1995).
10. R. Carpio, J. Farkas, and R. Jairath, Thin Solid Films, 266, 238 (1995).
11. W. L. C. M. Heyboer, G. A. C. M. Spierings, and J. E. A. M. van den Meerakker, This Journal, 138, 774 (1991).
12. V. Brusic, D. Scherber, F. Kaufman, R. Kistler, and C. C. Streinz, Abstract 501, p. 607, The Electrochemical Society Meeting Abstracts, Vol. 96-2, San Antonio, TX, Oct. 16-11, 1996.
13. C. C. Streinz, D. Ligocki, T. Myers, and V. Brusic, ibid., Abstract 502, p. 609.
14. G. S. Kelsey, This Journal, 124, 814 (1977).
15. Standard Potentials in Aqueous Solution, A. J. Bard, R. Parsons, and J. Jordan, Editors, Marcel Dekker, Inc., New York (1985).
16. I. Kim, K. Murella, J. Schlueter, E. Nikkel, J. Traut, and G. Castleman, Semiconductor Int., 12, 119 (1996).