Chemical mechanical polishing of polyarylether low dielectric constant layers by manganese oxide slurry

Journal of the Electrochemical Society

Volumn 146, Issue 6, 1999, Pages 2333-2336

  Hara, Tohru ^a   Tomisawa, Tomohiro ^a   Kurosu, Toshiaki ^a   Doy, Toshiro K ^b  

^a HOSEI UNIVERSITY   (Japan)

^b SAITAMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MANGANESE COMPOUNDS; ORGANIC POLYMERS; REMOVAL; SILICA; TANTALUM COMPOUNDS;

FUMED SILICA; LOW DIELECTRIC CONSTANT LAYERS; MANGANESE OXIDE; MECHANICAL POLISHING; POLYARYLETHER; TANTALUM NITRIDE;

CHEMICAL POLISHING;

EID: 0032628907     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391936     Document Type: Article

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