Role of oxidizer in the chemical mechanical planarization of the Ti/TiN barrier layer

Microelectronic Engineering

Volumn 65, Issue 4, 2003, Pages 478-488

  Chathapuram, V S ^a,b   Du, T ^a   Sundaram, K B ^a,b   Desai, V ^a  

^a Advanced Materials Processing and Analysis Center   (United States)

^b UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

Barrier layer; CMP; Oxidizer; Removal rate

Indexed keywords

ABRASION; ALUMINA; CHEMICAL MECHANICAL POLISHING; PH EFFECTS; SURFACE CHEMISTRY; TITANIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

PLANARIZATION;

MICROELECTRONICS;

EID: 0037623281     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00177-1     Document Type: Article

References (16)

1. Steigerwald J.M., Murarka S.P., Gutman R.J. Chemical Mechanical Planarization of Microelectronic Materials. 1997;Wiley, New York.
2. Kaufman F.B., Thompson D.B., Broadie R.E., Jaso M.A., Gutherie W.L., Pearson D.J., Small M.B. J. Electrochem. Soc. 138:1991;3460-3465.
3. Farkas J., Caprio R., Bajaj R., Galanakis C., Jairath R., Jones B., Tzeng S. Blumenthal R., Janssen G. Advanced Metallization for ULSI Applications/1994. 1995;25 Materials Research Society.
4. Kneer E.A., Raghunath C., Mathew V., Raghavan S., Jeon J.S. J. Electrochem. Soc. 144:1997;3041-3049.
5. Tamboli D., Desai V., Seal S., Sundaram K.B. Chemical mechanical polishing in IC device manufacturing III. Arimoto Y.A., Opila R.L., Reidsema Simpson C., Sundaram K.B., Ali I., Homma Y. The Electrochemical Society Proceedings:1999;333.
6. Tamboli D., Desai V., Seal S. Chemical mechanical planarization IV. Opila R.L., Reidsema-Simpson C., Sundaram K.B., Seal S. The Electrochemical Society Proceedings: 2000;212.
7. Stern M., Geary A.L. J. Electrochem. Soc. 104:1957;56-62.
8. Stern M., Weisert M. Proc. ASTM. 59:1959;1280-1281.
9. Chao C.Y., Lin L.F., Macdonald D.D. J. Electrochem. Soc. 128:1981;1187-1194.
10. Macdonald D.D., Urquidi-Macdonald M. J. Electrochem. Soc. 137:1990;2395-2402.
11. Lu F.H., Chen H.Y. Surf. Coatings Technol. 130:2000;290-296.
12. Rudenja S., Pan J., Wallinder I.O., Leygraf C., Kulu P. J. Electrochem. Soc. 146:1999;4082-4086.
13. Kuo H.-S., Tsai W.-T. J. Electrochem. Soc. 147:2000;149-154.
14. Aksu S., Doyle F.M. J. Electrochem. Soc. 148:2001;B51-57.
15. Wagner C.D., Riggs W.M., Davis L.E., Moulder J.F., Muilenberg G.E. Handbook of X-ray Photoelectron Spectroscopy. 1979;Perkin-Elmer, Physical Electronics Division, Eden Prairie, MN.
16. Murata M., Wakino K., Ikeda S. J. Electrochem. Spectrosc. 6:1975;459-464.