In situ electrochemical investigation of tungsten electrochemical behavior during chemical mechanical polishing

Journal of the Electrochemical Society

Volumn 145, Issue 9, 1998, Pages 3190-3196

  Stein, David J ^a   Hetherington, Dale ^a   Guilinger, Terry ^a   Cecchi, Joseph L ^a  

^a UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASION; ALUMINA; AMMONIUM COMPOUNDS; CHARGE TRANSFER; CHEMICAL POLISHING; ELECTRIC RESISTANCE; ELECTROCHEMISTRY; IRON COMPOUNDS; OXIDATION; PASSIVATION; POLARIZATION; POTASSIUM COMPOUNDS;

AMMONIUM PERSULFATE; CHEMICAL MECHANICAL POLISHING (CMP); FERRIC NITRATE; POTASSIUM IODATE;

TUNGSTEN;

EID: 0032167273     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838785     Document Type: Article

References (15)