Optimizing the thin film morphology of organic fieldeffect transistors: The influence of molecular structure and vacuum deposition parameters on device performance

Polymer Reviews

Volumn 46, Issue 1, 2006, Pages 79-101

  Locklin, Jason ^a   Roberts, Mark E ^a   Mannsfeld, Stefan C B ^a   Bao, Zhenan ^a  

^a Stanford University   (United States)

Author keywords

Fieldeffect mobility; Fieldeffect transistor; Nucleation and growth; Organic semiconductor; Thin film morphology; Vacuum deposition

Indexed keywords

CHARGE TRANSFER; MORPHOLOGY; NUCLEATION; OLIGOMERS; SEMICONDUCTOR MATERIALS; THIN FILMS; MOLECULAR STRUCTURE; SEMICONDUCTING ORGANIC COMPOUNDS; VACUUM;

FIELDEFFECT MOBILITY; NUCLEATION AND GROWTH; VACUUM DEPOSITION; FIELD-EFFECT MOBILITY; THIN FILM MORPHOLOGY;

FIELD EFFECT TRANSISTORS;

EID: 32944476288     PISSN: 15321797     EISSN: 15329038     Source Type: Journal    
DOI: 10.1080/15321790500471244     Document Type: Article

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