Organic thin film transistors based on cyclohexyl-substituted organic semiconductors

Chemistry of Materials

Volumn 17, Issue 13, 2005, Pages 3366-3374

  Locklin, Jason ^a,b,c   Li, Dawen ^c   Mannsfeld, Stefan C B ^b   Borkent, Evert Jan ^c   Meng, Hong ^c   Advincula, Rigoberto ^a   Bao, Zhenan ^b  

^a University of Houston   (United States)

^b Stanford University   (United States)

^c LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FIELD EFFECT MOBILITY; OLIGOTHIOPHENES; PERYLENE DIIMIDE; VACUUM-DEPOSITED FILMS;

ATOMIC FORCE MICROSCOPY; CHARGE TRANSFER; LIGHT EMITTING DIODES; OLIGOMERS; OPTICAL DEVICES; ORGANIC POLYMERS; PHOTOVOLTAIC CELLS; SEMICONDUCTING ORGANIC COMPOUNDS; SOLUBILITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

THIN FILM TRANSISTORS;

EID: 22944444210     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm047851g     Document Type: Article

References (26)

1. Horowitz, G. Adv. Mater. 1998, 10, 365.
2. Katz, H. E.; Lovinger, A. J.; Johnson, J.; Kloc, C.; Siegrist, T.; Li, W.; Lin, Y. Y.; Dodabalapur, A. Nature 2000, 404, 478.
3. Burroughes, J. H.; Bradley, D. D. C.; Brown, A. R.; Marks, R. N.; Mackay, K.; Friend, R. H.; Burn, P. L.; Holmes, A. B. Nature 1990, 347, 539.
4. Sariciftci, N. S.; Smilowitz, L.; Heeger, A. J.; Wudl, F. Science 1992, 258, 1474.
5. Yu, G.; Gao, J.; Hummelen, J. C.; Wudl, F.; Heeger, A. J. Science 1995, 270, 1789.
6. Bredas, J. L.; Adant, C.; Tackx, P.; Persoons, A. Chem. Rev. 1994, 94, 243.
7. Servet, B.; Horowitz, G.; Ries, S.; Lagorse, O.; Alnot, P.; Yassar, A.; Deloffre, F.; Srivastava, P.; Hajlaoui, P.; Lang, P.; Garnier, F. Chem. Mater. 1994, 6, 1809.
8. Grundlach, J. B.; Lin, Y. Y.; Jackson, T. N.; Nelson, S. F.; Schlom, D. G. IEEE Electron Device Lett. 1997, 78, 87.
9. Katz, H. E.; Lovinger, A. J.; Dodabalapur, A. Chem. Mater. 1996, 8, 2542.
10. Nelson, J. C.; Saven, J. G.; Moore, J. S.; Wolynes, P. G. Science 1997, 277, 1793.
11. Ruiz, R.; Choudhary, D.; Nickel, B.; Toccoli, T.; Chang, K.-C.; Mayer, A.; Clancy, P.; Blakey, J. M.; Headrick, R. L.; Iannotta, S.; Malliaras, G. Chem. Mater. 2004, 16, 4497.
12. Horowitz, G.; Hajlaoui, M. E. Adv. Mater. 2000, 12, 1046.
13. Ertl, G.; Küppers, J. Low Energy Electrons and Surface Chemistry; VCH Verlagsgesellschaft: Weinheim, 1985.
14. Clarke, L. J. Surface Crystallography; John Wiley & Sons Ltd: New York, 1985.
15. Dodabalapur, A.; Laquindanum, J.; Katz, H. E.; Bao, Z. Appl. Phys. Lett. 1996, 69, 4227.
16. Tate, J.; Rogers, J. A.; Jones, C. D. W.; Vyas, B.; Murphy, D. W.; Li, W.; Bao, Z.; Slusher, R. E.; Dodabalapur, A.; Katz, H. E. Langmuir 2000, 16, 6054.
17. Bao, Z.; Dodabalapur, A.; Lovinger, A. J. Appl. Phys. Lett. 1996, 69, 306.
18. Katz, H. E.; Lovinger, A. J.; Laquindanum, J. G. Chem. Mater. 1998, 10, 457.
19. Someya, T.; Katz, H. E.; Gelperin, A.; Lovinger, A. J.; Dodabalapur, A. Appl. Phys. Lett. 2002, 81, 3079.
20. Garnier; F.; Hajlaoui, R.; El Kassmi, A.; Horowitz, G.; Laigre, L.; Porzio, W.; Armanini, M.; Provasoli, F. Chem. Mater. 1998, 10, 3334.
21. Katz, H. E.; Siegrist, T.; Lefenfeld, M.; Gopalan, P.; Mushrush, M.; Ocko, B.; Gang, O.; Jisrawl, N. J. Phys. Chem. B. 2004, 108, 8567.
22. Locklin, J.; Mannsfeld, S. C. B.; Bao, Z. Manuscript in preparation.
23. Malenfant, P. R. L.; Dimitrakopoulos, C. D.; Gelorme, J. D.; Kosbar, L. K.; Graham, T. O.; Curioni, A.; Andreoni, W. Appl. Phys. Lett. 2002, 80, 2517.
24. Horowitz, G.; Kouki, F.; Spearman, P.; Fichou, D.; Nogues, C.; Pan, X.; Garnier, F. Adv. Mater. 1996, 8, 242.
25. Chesterfield, R.; McKeen, J. C.; Newman, C. R.; Frisbie, C. D.; Ewbank, P. C.; Mann, K. R.; Miller, L. L. J. Appl. Phys. 2004, 95, 6396.
26. Jones, B. A.; Ahrens, M. J.; Yoon, M.-H.; Facchetti, A.; Marks, T. J.; Wasielewski, M. R. Angew. Chem., Int. Ed. 2004, 43, 6363.