SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 161, Issue 2-3, 2002, Pages 111-119

The depth profile analysis of W-Si-N coatings after thermal annealing

(6) Louro, C a Cavaleiro, A a Dub, S b Smid, P c Musil, J c Vlcek, J c

a UNIVERSITY OF COIMBRA (Portugal)

b BAKUL INSTITUTE FOR SUPERHARD MATERIALS (Ukraine)

c UNIVERSITY OF WEST BOHEMIA (Czech Republic)

Author keywords

Nanoindentation; Sputtering; Thermal annealing; W Si N

Indexed keywords

ANNEALING; COMPOSITION; CRYSTALLIZATION; HARDNESS; NITROGEN; STEEL; TUNGSTEN ALLOYS;

COATING THICKNESS;

AMORPHOUS FILMS;

ANNEALING; CHEMICAL COMPOSITION; COATING; CRYSTALLIZATION; FILM THICKNESS; MECHANICAL PROPERTY;

EID: 0037010577 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(02)00325-0 Document Type: Article

Times cited : (14)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.