Chemical state of (Ta, Si)N reactively sputtered coating on a high-speed steel substrate

Surface and Coatings Technology

Volumn 123, Issue 1, 2000, Pages 1-7

  Nah, J W ^a   Choi, W S ^a   Hwang, S K ^a   Lee, C M ^a  

^a Inha University   (South Korea)

Author keywords

(Ta, Si)N; AES; Coating; Hardness; Sputtering; Steel; Substrate; XPS; XRD

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; COMPOSITION EFFECTS; MICROHARDNESS; PHASE TRANSITIONS; SILICON NITRIDE; SPUTTER DEPOSITION; STEEL; SUBSTRATES; TANTALUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

MULTIPHASE COMPOUNDS; REACTIVE SPUTTERING;

PROTECTIVE COATINGS;

COATING; HARDNESS; SPUTTERING; STEEL;

EID: 0034113308     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00395-3     Document Type: Article

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