Transport in microcrystalline silicon thin films deposited at low temperature by hot-wire chemical vapor deposition

Thin Solid Films

Volumn 501, Issue 1-2, 2006, Pages 133-136

  Bourée, Jean Eric ^a   Jadkar, Sandesh R ^b   Kasouit, Samir ^a   Vanderhaghen, Régis ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b UNIVERSITY OF PUNE   (India)

Author keywords

Electronic transport; Hot wire chemical vapor deposition; Hydrogen; Microcrystalline silicon

Indexed keywords

CHARGE CARRIERS; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; HYDROGEN; MICROWAVES; SILICON;

ELECTRONIC TRANSPORT; HOT-WIRE CHEMICAL VAPOR DEPOSITION; MICROCRYSTALLINE SILICON;

THIN FILMS;

EID: 32644480455     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.140     Document Type: Conference Paper

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