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Thin Solid Films
Volumn 395, Issue 1-2, 2001, Pages 157-162
Correlated structural and electronic properties of microcrystalline silicon films deposited at low temperature by catalytic CVD
(1)
Bouree J E
a
a
LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES
(
France
)
Author keywords
Catalytic chemical vapor deposition (Cat CVD); Microcrystalline silicon on glass; Thin films
Indexed keywords
AMORPHOUS FILMS; AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; ELLIPSOMETRY; FOURIER TRANSFORMS; GLASS; SEMICONDUCTING SILICON; SILICON SOLAR CELLS; SUBSTRATES;
MICROVOIDS; VARIABLE DILUTION PROCESSES;
THIN FILMS;
EID
:
0035800978
PISSN
:
00406090
EISSN
:
None
Source Type
:
Journal
DOI
:
10.1016/S0040-6090(01)01247-0
Document Type
:
Conference Paper
Times cited : (
9
)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.
