Combined nanoimprint-and-photolithography technique with a hybrid mold

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 337-347

  Cheng, Xing ^a   Chang, Meng Han ^a   Guo, L Jay ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

Nanofabrication; Nanoimprint; hybrid mask; Nanolithography; S FIL

Indexed keywords

MASKS; NANOTECHNOLOGY; PLASMA ETCHING; PLASTIC MOLDS; PRINTING; VISCOSITY; VISCOUS FLOW;

HYBRID MASKS; NANOIMPRINT LITHOGRAPHY (NIL); S-FIL;

PHOTOLITHOGRAPHY;

EID: 3843128507     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536121     Document Type: Conference Paper

References (12)

1. S. Y. Chou, P. R. Krauss, P. J. Renstrom, Appl. Phys. Lett. 67, 3114 (1995); and Science 272, 85 (1996).
2. S. Y. Chou, P. R. Krauss, P. J. Renstrom, Appl. Phys. Lett. 67, 3114 (1995); and Science 272, 85 (1996).
3. S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, L. Zhuang, J. Vac. Sci. Technol. B 15, 2897 (1997).
4. H. Schift, L. J. Heyderman, M. Auf der Maur, J. Gobrecht, Nanotechnology 12, 173 (2001).
5. L. J. Heyderman, H. Schift, C. David, J. Gobrecht, T. Schweizer, Microelectron. Eng. 54, 229 (2000).
6. M. Otto, M. Bender, B. Hadam, B. Spangenberg, H. Kurz, Microelectron. Eng. 57-58, 361 (2001).
7. H.-C. Scheer, H. Schulz, T. Hoffmann, C. M. Sotomayor Torres, J. Vac. Sci. Technol. B 16, 3917 (1998).
8. H.-C. Scheer, H. Schulz, Microelectron. Eng. 56, 311 (2001).
9. K. Pfeiffer, M. Fink, G. Gruetzner, G. Bleidiessel, H. Schulz, and H. Scheer, Microelectron. Eng. 57-8, 381 (2001); L. Montelius, B. Heidari, M. Graczyk, I. Maximov, E.-L. Sarwe, and T. G. I. Ling, Microelectron. Eng. 53 (1-4), 521 (2000).
10. K. Pfeiffer, M. Fink, G. Gruetzner, G. Bleidiessel, H. Schulz, and H. Scheer, Microelectron. Eng. 57-8, 381 (2001); L. Montelius, B. Heidari, M. Graczyk, I. Maximov, E.-L. Sarwe, and T. G. I. Ling, Microelectron. Eng. 53 (1-4), 521 (2000).
11. X. Cheng and L. J. Guo, "One-Step Lithography for Various Size Patterns with a Hybrid Mask-Mold," in press, Microelectron. Eng. 2004; published online Feb. 2004.
12. X. Cheng and L. J. Guo, "A Combined-Nanoimprint-and-Photolithography Patterning Technique," in press, Microelectron. Eng. 2004; published online Feb. 2004.