Electronic structures of CF3- for studying dissociative electron attachment to CF3 radicals

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 5 A, 2004, Pages 2711-2715

  Hayashi, Daiyu ^a,b  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Germany)

Author keywords

CF3; CF3 ; Dissociative attachment; Electron affinity; F ; Fluorocarbon; Plasma

Indexed keywords

APPROXIMATION THEORY; DATA REDUCTION; DIFFUSION; DISSOCIATION; ELECTRONIC STRUCTURE; KINETIC ENERGY; PERTURBATION TECHNIQUES; PLASMAS;

CF3; CF3-; DISSOCIATIVE ATTACHMENT; ELECTRON AFFINITIES (EA); F-;

FLUOROCARBONS;

EID: 3142656660     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.2711     Document Type: Article

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