|
Volumn 38, Issue 7 B, 1999, Pages 4383-4388
|
Decay processes of electrons in the afterglow of high-density CF4, c-C4F8 and CF4-H2 plasmas
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CARRIER CONCENTRATION;
ELECTRON DENSITY MEASUREMENT;
FLUOROCARBONS;
INTERFEROMETERS;
MAGNETIC FIELD EFFECTS;
MOLECULES;
PLASMA SOURCES;
DISSOCIATIVE ELECTION ATTACHMENT;
ELECTRON LOSS FREQUENCY;
MICROWAVE INTERFEROMETER;
NEGATIVE FLUORINE IONS;
PLASMAS;
|
EID: 0033157660
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.38.4383 Document Type: Article |
Times cited : (8)
|
References (23)
|