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Volumn 38, Issue 7 B, 1999, Pages 4383-4388

Decay processes of electrons in the afterglow of high-density CF4, c-C4F8 and CF4-H2 plasmas

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; ELECTRON DENSITY MEASUREMENT; FLUOROCARBONS; INTERFEROMETERS; MAGNETIC FIELD EFFECTS; MOLECULES; PLASMA SOURCES;

EID: 0033157660     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.4383     Document Type: Article
Times cited : (8)

References (23)
  • 18
    • 33645044343 scopus 로고    scopus 로고
    • Ext. Abstr. Japan Society of Applied Physics, 4p-B-12 [in Japanese]
    • Y. Ohya, S. Hirose, A. Kono and T. Goto: Ext. Abstr. (58th Autumn Meet., 1997) Japan Society of Applied Physics, 4p-B-12 [in Japanese].
    • (1997) 58th Autumn Meet.
    • Ohya, Y.1    Hirose, S.2    Kono, A.3    Goto, T.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.