Role of reaction products in F- production in low-pressure, high-density CF4 plasmas

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 10, 1999, Pages 6084-6089

  Hayashi, Daiyu ^a   Nakamoto, Masahiko ^a   Takada, Noriharu ^a   Sasaki, Koichi ^a   Kadota, Kiyoshi ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; IONIZATION OF SOLIDS;

HELICON WAVE PLASMAS;

SEMICONDUCTOR PLASMAS;

EID: 0033345110     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.6084     Document Type: Article

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