X-ray reflectometry and x-ray fluorescence monitoring of the atomic layer deposition process for high- k gate dielectrics

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 5, 2005, Pages 2244-2248

  Hung, P Y ^a   Gondran, Carolyn ^b   Ghatak Roy, Amiya ^c   Terada, Shinichi ^d   Bunday, Ben ^a   Yeung, Henry ^c   Diebold, Alain ^a  

^a SEMATECH   (United States)

^b ATDF Inc   (United States)

^c Technos International Inc   (United States)

^d Technos Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; FILM DEGRADATION; X-RAY FLUORESCENCE (XRF);

AUGER ELECTRON SPECTROSCOPY; DEGRADATION; DEPOSITION; DIELECTRIC MATERIALS; FLUORESCENCE; TRANSMISSION ELECTRON MICROSCOPY;

X RAY ANALYSIS;

EID: 31144469580     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2009774     Document Type: Conference Paper

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