Particle simulation of radio-frequency plasma discharges of methane for carbon film deposition

IEEE Transactions on Plasma Science

Volumn 26, Issue 2, 1998, Pages 125-134

  Nagayama, Katsuya ^a   Farouk, Bakhtier ^b   Lee, Young H ^b  

^a SUMITOMO ELECTRIC INDUSTRIES LTD   (Japan)

^b Drexel University   (United States)

Author keywords

Capacitively coupled plasma; Carbon film; Simulation

Indexed keywords

CARBON; COMPUTER SIMULATION; DEPOSITION; DISSOCIATION; FILM GROWTH; GLOW DISCHARGES; IONIZATION OF GASES; METHANE; MONTE CARLO METHODS; PLASMA COLLISION PROCESSES; PLASMA SHEATHS; PLASMA SIMULATION;

CAPACITIVELY COUPLED PLASMAS; PARTICLE IN CELL METHOD;

PLASMA APPLICATIONS;

EID: 0032049144     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.669604     Document Type: Article

References (23)

1. C. K. Birdsall and A. B. Langdon, Plasma Physics Via Computer Simulation. New York: McGraw-Hill, 1985.
2. C. K. Birdsall, "Particle-in-cell charged-particle simulations, plus Monte Carlo collisions with neutral atoms, PIC-MCC," IEEE Trans. Plasma Sei., vol. 19, pp. 65-85, 1991.
3. R. J. Boswell and I. J. Morney, "Self-consistent simulation of a parallelplate RF discharge," Appl. Phys. Lett., vol. 52, pp. 21-23, 1988.
4. M. Surendra and D. B. Graves, "Particle simulation of radio-frequency glow discharges," IEEE Trans. Plasma Sei., vol. 19, pp. 144-157, 1991.
5. H. W. Trombley, F. L. Terry, and M. E. Elta, "A self-consistent particle model for the simulation of RF glow discharges," IEEE Trans. Plasma Sei., vol. 19, pp. 158-162, 1991.
6. A. Date, K. Kitamori, Y. Sakai, and H. Tagashira, "Self-consistent Monte Carlo modeling of RF plasma in a helium-like model gas," J. Phys. D, Appl. Phys., vol. 25, pp. 442-52, 1992.
7. T. J. Sommerer and M. J. Kushner, "Numerical investigation of the kinetics and chemistry of RF glow discharge plasmas sustained in He, O2, He/N2/O2, He/CF4O2, and SiH4/NH3 using a Monte Carlo-fluid model," J. Appl. Phys., vol. 71, pp. 1654-1673, 1992.
8. N. Sato and H. Tagashira, "A hybrid Monte Carlo/fluid model of RF plasmas in a SiH4/H2 mixture," IEEE Trans. Plasma Sei., vol. 19, pp. 102-111, 1991.
9. K. Nagayama, B. Farouk, and Y. H. Lee, "Modeling of RF plasma discharges of polyatomic gases for carbon film deposition," in Proc. I2th Int. Symp. Plasma Chemistry, Minneapolis, MN, Aug. 1995, vol. 4, pp. 2247-2253.
10. "Neutral and charged particle simulation of RF Ar plasma," Plasma Sources Sei. Technol., vol. 5, pp. 685-695, 1996.
11. D. J. Economou, T. J. Bartel, R. S. Wise, and D. P. Lymberopoulos, "Two-dimensional direct simulation Monte Carlo (DSMC) of reactive neutral and ion flow in a high density plasma," IEEE Trans. Plasma Sei., vol. 23, pp. 581-595, 1995.
12. G. A. Bird, Molecular Gas Dynamics. Oxford, U.K.: Clarendon, 1976.
13. C. Borgnakke and P. S. Larsen "Statistical collision model for Monte Carlo simulation of polyatomic gas mixture,"/ Comput. Phys., vol. 18, pp. 405-20, 1975.
14. K. Nanbu, S. Igarashi, and S. Mitamura "Molecular simulation of a gasphase reaction in a low pressure CVD reactor," Rep. Inst. Fluid Science, Tohoku University, Sendai, Japan, vol. 3, no. 35, 1991.
15. E. Gogolides, D. Mary, A. Rhallabi, and G. Turban, "RF plasmas in methane: Prediction of plasma properties and neutral radical densities with combined gas phase physics and chemistry model," Jpn. J. Appl. Phys., vol. 34, pp. 261-270, 1995.
16. W. L. Morgan, "A critical of low-energy electron impact cross sections for plasma processing modeling. II: CF4, SiFLj, and CFLj," Plasma Chem. Plasma Process., vol. 12, no. 4, pp. 477-183, 1992.
17. L. E. Kline, W. D. Partlow, and W. E. Biee, "Electron and chemical kinetics in methane RF glow-discharge deposition plasmas," J. Appl. Phys., vol. 65, no. 1, p. 70-78, 1989.
18. A. Rhallabi and Y. Catherine, "Computer simulation of a carbondeposition plasma in CH4," IEEE Trans. Plasma Sei., vol. 19, pp. 261-270, Apr. 1991.
19. J. D. P. Passchier and W. J. Goedheer, "A two-dimensional fluid model for an argon RF discharge," J. Appl. Phys., vol. 74, no. 6, pp. 3744-3751, 1993.
20. Y. Catherine and P. Coudrec, "Electrical characteristics and growth kinetics in discharges used for plasma deposition amorphous carbon," Thin Solid Films, vol. 144, pp. 265-280, 1986.
21. K. E. Spear and J. P. Dismukes, Synthetic Diamond: Emerging CVD Science and Technology. New York: Wiley, 1994.
22. D. B. Graves, "A continuum model of DC and RF discharges," IEEE Trans. Plasma Sei., vol. PS14, p. 78-91, Apr. 1986.
23. K. Tachibana, M. Nishida, H. Harima, and Y. Urano, "Diagnostics and modeling of a methane plasma used in the chemical vapor deposition of amorphous films," J. Phys D, Appl. Phys., vol. 17, pp. 1727-1742, 1984.