Chemical vapor deposition of single-walled carbon nanotubes using ultrathin Ni/Al film as catalyst

Nano Letters

Volumn 3, Issue 6, 2003, Pages 731-735

  Zhang, Ruth Y ^a   Amlani, Islamshah ^a   Baker, Jeff ^a   Tresek, John ^a   Tsui, Raymond K ^a   Fejes, Peter ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CARBON; GOLD; NICKEL;

ARTICLE; CATALYST; ELECTRIC CURRENT; ELECTRIC POTENTIAL; ELECTRIC RESISTANCE; ELECTRODE; FILM; NANOTECHNOLOGY; THICKNESS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR;

EID: 0141563569     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl034154z     Document Type: Article

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